The ZEISS Crossbeam 350 combines ZEISS FIB Ion-sculptor milling with ZEISS Gemini 1 imaging to cover a wide range of applications, including non-conductive, magnetic, and non-compatible samples under high vacuum conditions. The system provides high-resolution imaging, sample preparation, and micro and nanopatterning capabilities.
The system includes a Trumpf pulsed laser for micromachining of samples for different applications.

Manufacturer: Carl Zeiss
Model: Crossbeam 350
Location: UCTAI: Area Electronica. Sala limpia Ed. El Sario. UPNA. Pamplona.